Eric Solecky

Metrology capabilities and needs for 7nm and 5nm logic nodes

Benjamin Bunday, Eric Solecky, Alok Vaid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 37 citations

Engineering, Measurement, Digital Manufacturing +19

7/5nm logic manufacturing capabilities and requirements of metrology

Benjamin Bunday, A. F. Bello, Eric Solecky et al. · 2018 · 36 citations

In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Eric Solecky, Oliver D. Patterson, Andrew Stamper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 27 citations

Engineering, Electron-beam Lithography, Measurement +21

Value-Added Metrology

Benjamin Bunday, John A. Allgair, Mark Caldwell et al. · IEEE Transactions on Semiconductor Manufacturing · 2007 · 22 citations

Engineering, Industrial Engineering, Measurement +19

Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Bill Banke, Charles N. Archie, Matthew Sendelbach et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 18 citations

Measurement Theory, Engineering, Measurement +23