A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Alok Vaid, Bin Bin Yan, Yun Tao Jiang, +17

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementMicroscopyEducation +17

Metrology capabilities and needs for 7nm and 5nm logic nodes

Benjamin Bunday, Eric Solecky, Alok Vaid, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementDigital ManufacturingComputer ArchitectureEducation +17

7/5nm logic manufacturing capabilities and requirements of metrology

Benjamin Bunday, A. F. Bello, Eric Solecky, +1

In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Eric Solecky, Oliver D. Patterson, Andrew Stamper, +7

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementMicroscopyDefect Inspection +19

Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes

Dhairya Dixit, Nick Keller, Yevgeny Lifshitz, +5

Journal of Micro/Nanolithography MEMS and MOEMS

Use of multiple azimuthal angles to enable advanced scatterometry applications

Matthew Sendelbach, Alok Vaid, Pedro Herrera, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringOptical TestingCritical ParameterInterferometry +22

Hybrid metrology solution for 1X node technology

Alok Vaid, Alexander Elia, Mark Kelling, +16

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementEducationComputer-aided Design +19

Hybrid metrology: from the lab into the fab

Alok Vaid, Alexander Elia, Givantha Iddawela, +5

Journal of Micro/Nanolithography MEMS and MOEMS

EngineeringElectron-beam LithographyMicroscopyOptical MetrologyDimensional Metrology +18

Time-dependent electron-beam-induced photoresist shrinkage effects

Benjamin Bunday, Aaron Cordes, Carsten Hartig, +4

Journal of Micro/Nanolithography MEMS and MOEMS

EngineeringElectron MicroscopyPhysicsMicroscopyMeasurement +13

Implementation of hybrid metrology at HVM fab for 20nm and beyond

Alok Vaid, Lokesh Subramany, Givantha Iddawela, +10

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementDigital ManufacturingOptical MetrologyEducation +18