Alok Vaid

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Alok Vaid, Bin Bin Yan, Yun Tao Jiang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 65 citations

Engineering, Electron-beam Lithography, Measurement +19

Metrology capabilities and needs for 7nm and 5nm logic nodes

Benjamin Bunday, Eric Solecky, Alok Vaid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 37 citations

Engineering, Measurement, Digital Manufacturing +19

7/5nm logic manufacturing capabilities and requirements of metrology

Benjamin Bunday, A. F. Bello, Eric Solecky et al. · 2018 · 36 citations

In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Eric Solecky, Oliver D. Patterson, Andrew Stamper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 27 citations

Engineering, Electron-beam Lithography, Measurement +21

Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes

Dhairya Dixit, Nick Keller, Yevgeny Lifshitz et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 24 citations