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Rehovot, Israel
115
A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM
Alok Vaid, Bin Bin Yan, Yun Tao Jiang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 65 citations
Engineering, Electrical Engineering, Manufacturing Engineering +16
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