Quantitative Study of the Effect of the Environment on Macroscopic Quantum Tunneling

Daniel Schwartz, Bidyut Sen, Charles N. Archie, +1

Physical Review Letters

EngineeringJosephson JunctionsQuantum ComputingTunneling MicroscopyQuantum Mechanical Property +14

Properties of melting 3He: Specific heat, entropy, latent heat, and temperature

W. P. Halperin, Finn Rasmussen, Charles N. Archie, +1

Journal of Low Temperature Physics

Materials ScienceEngineeringPhysicsSpecific HeatEntropy +10

Viscosity measurements in superfluid 3He-B from 2 to 29 bar

Charles N. Archie, T. A. Alvesalo, J. D. Reppy, +1

Journal of Low Temperature Physics

Rheological MeasurementEngineeringPhysicsLiquid-liquid FlowFluid Mechanics +5

Scatterometry measurement precision and accuracy below 70 nm

Matthew Sendelbach, Charles N. Archie

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementOptical TestingAccuracy And PrecisionScatterometry Measurement Precision +18

Review of current progress in nanometrology with the helium ion microscope

Michael T. Postek, András Vládar, Charles N. Archie, +1

Measurement Science and Technology

EngineeringMicroscopyHelium Ion SourceElectron OpticCurrent Progress +18

Feedforward of mask open measurements on an integrated scatterometer to improve gate linewidth control

Matthew Sendelbach, W. Natzle, Charles N. Archie, +8

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringWafer Scale ProcessingEngineeringAdvanced Packaging (Semiconductors)Physical Design (Electronics) +13

Characteristics of accuracy for CD metrology

G. W. Banke, Charles N. Archie

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementMetrology Tool FoesAccuracy And PrecisionEducation +18

Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement

ChungHsi J. Wu, Wu‐Song Huang, K. Rex Chen, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementEducationResist Shrinkage +20

Value-Added Metrology

Benjamin Bunday, John A. Allgair, Mark Caldwell, +6

IEEE Transactions on Semiconductor Manufacturing

EngineeringIndustrial EngineeringMeasurementEducationDimensioning And Tolerancing +17

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Matthew Sendelbach, Charles N. Archie, Bill Banke, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementIn-line MetrologyElectrical Gate MeasurementsEducation +14