A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Alok Vaid, Bin Bin Yan, Yun Tao Jiang, +17

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementMicroscopyEducation +17

Scatterometry measurement precision and accuracy below 70 nm

Matthew Sendelbach, Charles N. Archie

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementOptical TestingAccuracy And PrecisionScatterometry Measurement Precision +18

Feedforward of mask open measurements on an integrated scatterometer to improve gate linewidth control

Matthew Sendelbach, W. Natzle, Charles N. Archie, +8

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringWafer Scale ProcessingEngineeringAdvanced Packaging (Semiconductors)Physical Design (Electronics) +13

Performance enhancement on sub-70 nm strained silicon SOI MOSFETs on ultra-thin thermally mixed strained silicon/SiGe on insulator (TM-SGOI) substrate with raised S/D

B.H. Lee, A. Mocuta, Stephen W. Bedell, +25

Semiconductor TechnologyElectrical EngineeringPerformance EnhancementEngineeringDevice Benefits +10

Integrated scatterometry in high-volume manufacturing for polysilicon gate etch control

Matthew Sendelbach, A.G. Muñoz, K. Bandy, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementEducationGate PatterningSilicon On Insulator +15

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Matthew Sendelbach, Charles N. Archie, Bill Banke, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringMeasurementIn-line MetrologyElectrical Gate MeasurementsEducation +14

Use of multiple azimuthal angles to enable advanced scatterometry applications

Matthew Sendelbach, Alok Vaid, Pedro Herrera, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringOptical TestingCritical ParameterInterferometry +22

Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Bill Banke, Charles N. Archie, Matthew Sendelbach, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Measurement TheoryEngineeringMeasurementAccuracy And PrecisionEducation +21

Hybrid metrology solution for 1X node technology

Alok Vaid, Alexander Elia, Mark Kelling, +16

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementEducationComputer-aided Design +19

Hybrid metrology: from the lab into the fab

Alok Vaid, Alexander Elia, Givantha Iddawela, +5

Journal of Micro/Nanolithography MEMS and MOEMS

EngineeringElectron-beam LithographyMicroscopyOptical MetrologyDimensional Metrology +18