Matthew Sendelbach

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Alok Vaid, Bin Bin Yan, Yun Tao Jiang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 65 citations

Engineering, Electron-beam Lithography, Measurement +19

Scatterometry measurement precision and accuracy below 70 nm

Matthew Sendelbach, Charles N. Archie · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 61 citations

Engineering, Measurement, Optical Testing +20

Feedforward of mask open measurements on an integrated scatterometer to improve gate linewidth control

Matthew Sendelbach, W. Natzle, Charles N. Archie et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 29 citations

Electrical Engineering, Wafer Scale Processing, Engineering +15

Performance enhancement on sub-70 nm strained silicon SOI MOSFETs on ultra-thin thermally mixed strained silicon/SiGe on insulator (TM-SGOI) substrate with raised S/D

B.H. Lee, A. Mocuta, Stephen W. Bedell et al. · 2003 · 24 citations

Semiconductor Technology, Electrical Engineering, Performance Enhancement +12

Integrated scatterometry in high-volume manufacturing for polysilicon gate etch control

Matthew Sendelbach, A.G. Muñoz, K. Bandy et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 23 citations

Engineering, Measurement, Education +17