B.H. Lee

Strained Si CMOS (SS CMOS) technology: opportunities and challenges

K. Rim, Robert E. Anderson, D. Boyd et al. · Solid-State Electronics · 2003 · 91 citations

Electrical Engineering, Engineering, Nanoelectronics +6

Mobility enhancement in strained Si NMOSFETs with HfO/sub 2/ gate dielectrics

K. Rim, E. P. Gusev, C. D’Emic et al. · 2003 · 29 citations

Gate Dielectrics, Electrical Engineering, Engineering +12

Performance enhancement on sub-70 nm strained silicon SOI MOSFETs on ultra-thin thermally mixed strained silicon/SiGe on insulator (TM-SGOI) substrate with raised S/D

B.H. Lee, A. Mocuta, Stephen W. Bedell et al. · 2003 · 24 citations

Semiconductor Technology, Electrical Engineering, Performance Enhancement +12

Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface

Joel Barnett, N. Moumen, J. Gutt et al. · MRS Proceedings · 2004 · 24 citations

Materials Engineering, Materials Science, Engineering +11

Band Edge n-MOSFETs with High-k/Metal Gate Stacks Scaled to EOT=0.9nm with Excellent Carrier Mobility and High Temperature Stability

P. D. Kirsch, Manuel Quevedo-López, Sitaraman Krishnan et al. · 2006 · 20 citations

Semiconductor Technology, Electrical Engineering, High Temperature Stability +15