John A. Allgair

Determination of optimal parameters for CD-SEM measurement of line-edge roughness

Benjamin Bunday, Michael Bishop, Donald W. McCormack et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 83 citations

Fundamental limits of optical critical dimension metrology: a simulation study

Richard M. Silver, Thomas A. Germer, Ravikiran Attota et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 67 citations

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Alok Vaid, Bin Bin Yan, Yun Tao Jiang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 65 citations

Engineering, Electron-beam Lithography, Measurement +19

Phenomenology of electron-beam-induced photoresist shrinkage trends

Benjamin Bunday, Aaron Cordes, John A. Allgair et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 24 citations · Full text

Engineering, Electron-beam Lithography, Microscopy +18

Characterization of CD-SEM metrology for iArF photoresist materials

Benjamin Bunday, Aaron Cordes, Ndubuisi G. Orji et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 23 citations

Cd-sem Metrology, Engineering, Electron-beam Lithography +18