Yasutoshi Nakagawa

Nanobeam process system: An ultrahigh vacuum electron beam lithography system with 3 nm probe size

Hiroshi Hiroshima, S. Okayama, Masayoshi Ogura et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 26 citations

Engineering, Electron-beam Lithography, Microscopy +18

Improvement of mask write time for curvilinear assist features at 22nm

Aki Fujimura, Ingo Bork, Taiichi Kiuchi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 16 citations

Engineering, Vlsi Design, Mask Write Time +17

Evaluation of a 100 kV thermal field emission electron-beam nanolithography system

D. M. Tennant, R. Fullowan, Hitoshi Takemura et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 16 citations

Electrical Engineering, Performance Evaluation Tests, Engineering +13

Writing wavy metal 1 shapes on 22-nm logic wafers with less shot count

Harold Zable, Aki Fujimura, Tadashi Komagata et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 15 citations

Wavy Metal 1, Engineering, Nm Logic Node +19

A thermally assisted field emission electron beam exposure system

H. Nakazawa, Hitoshi Takemura, M. Isobe et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 13 citations

Engineering, Electron-beam Lithography, Current Density +17