Statistics
Publications
4
Citations
70
H-Index
4
Active since
2000
Affiliations
Nokia (United States)(Current)
R. Fullowan is an author at Nokia (United States) specializing in engineering, optoelectronics, and microfabrication.
Publications per year
2000–2007
4
4
Evaluation of a 100 kV thermal field emission electron-beam nanolithography system
D. M. Tennant, R. Fullowan, Hitoshi Takemura et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 16 citations
Electrical Engineering, Performance Evaluation Tests, Engineering +13
Characterization of Piston-Tip-Tilt mirror pixels for scalable SLM arrays
F. Pardo, M.E. Simon, Vladimir Aksyuk et al. · 2006 · 12 citations
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