Ingo Bork

Modeling the impact of stress on silicon processes and devices

Victor Moroz, N. Strecker, Xiaopeng Xu et al. · Materials Science in Semiconductor Processing · 2003 · 46 citations

Electrical Engineering, Engineering, Hardware Reliability +11

Lithographic benefits and mask manufacturability study of curvilinear masks

Alexander Wei, Wei Guo, Fan Jiang et al. · 2018 · 19 citations

Electron-beam Lithography, Optic Design, Mask Process Correction +17

Study on various curvilinear data representations and their impact on mask and wafer manufacturing

Jin Choi, Soo Ryu, Sukho Lee et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2021 · 19 citations · Full text

Optimization of mask shot count using MB-MDP and lithography simulation

Gek Soon Chua, Wei Long Wang, Byoung Il Choi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 17 citations

Engineering, Mask Shapes, Computer Engineering +5

Influence of heat flux on the accuracy of hydrodynamic models for ultra-short Si MOSFETs

Ingo Bork, Christoph Jungemann, B. Meinerzhagen et al. · 2002 · 16 citations

Such Small Devices., Engineering, Ultra-short Si Mosfets +17