Shumay Shang

MRC for curvilinear mask shapes

Ingo Bork, Alexander Tritchkov, Shumay Shang et al. · 2020 · 16 citations

High accuracy 65nm OPC verification: full process window model vs. critical failure ORC

Amandine Borjon, Jérôme Belledent, Shumay Shang et al. · Optical Microlithography XVIII · 2005 · 13 citations

Engineering, Hardware Verification Language, Optical Testing +24

Model based insertion of assist features using pixel inversion method: implementation in 65nm node

Chi‐Yuan Hung, Qingwei Liu, Kyohei Sakajiri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 11 citations

Geometric Modeling, Sub-resolution Assist Feature, Physical Design (Electronics) +13

On objectives and algorithms of inverse methods in microlithography

Yuri Granik, Kyohei Sakajiri, Shumay Shang · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 11 citations

Numerical Analysis, Geometric Modeling, Inverse Microlithography +15

Gaussian random field EUV stochastic models, their generalizations and lithographically meaningful stochastic metrics

Azat Latypov, Gurdaman Khaira, Germain Fenger et al. · 2021 · 11 citations