Alexander Tritchkov

Double pattern EDA solutions for 32nm HP and beyond

George E. Bailey, Alexander Tritchkov, Jea-Woo Park et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 78 citations

Double-patterning Technique, Engineering, Vlsi Design +20

Intensive optimization of masks and sources for 22nm lithography

Alan E. Rosenbluth, David Melville, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 30 citations

Mask Optimization, Engineering, Electron-beam Lithography +11

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

David Melville, Alan E. Rosenbluth, Kehan Tian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Engineering, Electron-beam Lithography, Optic Design +16

Model-based SRAF insertion through pixel-based mask optimization at 32nm and beyond

Kyohei Sakajiri, Alexander Tritchkov, Yuri Granik · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 20 citations

Engineering, Vlsi Design, Computer Architecture +16

Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

David Melville, Alan E. Rosenbluth, Andreas Wäechter et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 19 citations

Computational Lithography, Engineering, Electron-beam Lithography +18