Aki Fujimura

A diagonal interconnect architecture and its application to RISC core design

M. Igarashi, T. Mitsuhashi, Alexandre Lê et al. · 2002 IEEE International Solid-State Circuits Conference. Digest of Technical Papers (Cat. No.02CH37315) · 2005 · 44 citations

Hardware Security, Electrical Engineering, Risc Core Design +15

Very Low Vitamin C Activity of Orally Administered <scp>l</scp>-Dehydroascorbic Acid

Yukako Ogiri, Fang Sun, Shoko Hayami et al. · Journal of Agricultural and Food Chemistry · 2001 · 41 citations

Food Chemistry, Nutrition, Dha Contents +13

How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+mask dual simulation

Ryan Pearman, P. Jeffrey Ungar, Nagesh Shirali et al. · 2019 · 25 citations

Engineering, Electron-beam Lithography, Industrial Engineering +17

Study of mask and wafer co-design that utilizes a new extreme SIMD approach to computing in memory manufacturing: full-chip curvilinear ILT in a day

Linyong Pang, E. Vidal Russell, Bill Baggenstoss et al. · 2019 · 20 citations

Optimization of mask shot count using MB-MDP and lithography simulation

Gek Soon Chua, Wei Long Wang, Byoung Il Choi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 17 citations

Engineering, Mask Shapes, Computer Engineering +5