Mihaela Balseanu

pMOSFET with 200% mobility enhancement induced by multiple stressors

L. Washington, F. Nouri, S. Thirupapuliyur et al. · IEEE Electron Device Letters · 2006 · 68 citations

Materials Engineering, Electrical Engineering, Engineering +15

Manufacturable Processes for $\leq$ 32-nm-node CMOS Enhancement by Synchronous Optimization of Strain-Engineered Channel and External Parasitic Resistances

Atif Noori, Mihaela Balseanu, Pieter Boelen et al. · IEEE Transactions on Electron Devices · 2008 · 39 citations

Engineering, Vlsi Design, Integrated Circuits +18

A reliable and manufacturable method to induce a stress of >1 GPa on a P-channel MOSFET in high volume manufacturing

Reza Arghavani, Li-Qun Xia, Hichem M’Saad et al. · IEEE Electron Device Letters · 2006 · 38 citations

Electrical Engineering, Engineering, Stress-induced Leakage Current +11

Advanced metal and dielectric barrier cap films for Cu low k interconnects

Deepika Priyadarshini, S. Nguyen, H. Shobha et al. · 2014 · 13 citations

Engineering, Advanced Metal, Thin Film Process Technology +19

Strain Engineering to Improve Data Retention Time in Nonvolatile Memory

Reza Arghavani, N. Derhacobian, V. Banthia et al. · IEEE Transactions on Electron Devices · 2007 · 12 citations

Non-volatile Memory, Engineering, Emerging Memory Technology +21