Kazuhide Ino

Ion energy, ion flux, and ion species effects on crystallographic and electrical properties of sputter-deposited Ta thin films

Kazuhide Ino, Toshikuni Shinohara, T. Ushiki et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 83 citations

Engineering, Ion Bombardment Conditions, Thin Film Process Technology +16

Tantalum-gate thin-film SOI nMOS and pMOS for low-power applications

Hiroyuki Shimada, Y. Hirano, T. Ushiki et al. · IEEE Transactions on Electron Devices · 1997 · 37 citations

Electrical Engineering, Engineering, Nanoelectronics +10

SiC Power Device Evolution Opening a New Era in Power Electronics

Kazuhide Ino, Mineo Miura, Yuki Nakano et al. · 2019 · 19 citations

Electrical Engineering, Semiconductor Device, Engineering +11

Plasma enhanced in situ chamber cleaning evaluated by extracted-plasma-parameter analysis

Kazuhide Ino, I. Natori, Akinori Ichikawa et al. · IEEE Transactions on Semiconductor Manufacturing · 1996 · 16 citations

Chemical Engineering, Engineering, Nonthermal Plasma +11

Gate oxide reliability concerns in gate-metal sputtering deposition process: an effect of low-energy large-mass ion bombardment

T. Ushiki, Mo-Chiun Yu, K. Kawai et al. · Microelectronics Reliability · 1999 · 14 citations

Materials Engineering, Electrical Engineering, Ion Implantation +9