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Gate oxide reliability concerns in gate-metal sputtering deposition process: an effect of low-energy large-mass ion bombardment

Materials EngineeringElectrical EngineeringIon ImplantationEngineeringNanoelectronicsStress-induced Leakage CurrentBias Temperature InstabilityApplied PhysicsDeposition ProcessMicroelectronicsReliability ConcernsChemical Vapor Deposition