Toru Tojo

Piezoelectrically driven <i>X</i> <i>Y</i>θ table for submicron lithography systems

Kazuyoshi Sugihara, Ichiro Mori, Toru Tojo et al. · Review of Scientific Instruments · 1989 · 36 citations

Submicron Lithography Systems, Electronic Devices, Engineering +15

Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system

Munehiro Ogasawara, Naoharu Shimomura, Jun Takamatsu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 18 citations

Electrical Engineering, Engineering, Electron Beam Mask +12

Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method

Takashi Kamikubo, Takayuki Abe, Susumu Oogi et al. · Japanese Journal of Applied Physics · 1997 · 13 citations

Electrical Engineering, Engineering, Proximity Effect Correction +15

Reduction of fogging effect caused by scattered electrons in an electron beam system

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Electrical Engineering, Engineering, Electron-beam Lithography +15

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Engineering, Electron-beam Lithography, Target Fabrication +16