Yoji Ogawa

Optimization of partially coherent optical system for optical lithography

Soichi Inoue, Tadahito Fujisawa, Shuichi Tamaushi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 14 citations

Optical Design, Optical Materials, Engineering +22

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Engineering, Electron-beam Lithography, Target Fabrication +16

EBM-5000: electron-beam mask writer for 45-nm node

H. Sunaoshi, Yuichi Tachikawa, Hitoshi Higurashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 10 citations

Electrical Engineering, Electron-beam Mask Writer, New Technologies +12