Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations · 0 references
EngineeringElectron-beam LithographyTarget FabricationAdvanced Electron-beamElectron OpticMicrometer GenerationBeam LithographyElectronic PackagingInstrumentationNanolithography MethodElectrical EngineeringComputer EngineeringMicroelectronicsToshiba Machine3D PrintingMicrofabricationApplied PhysicsAdvanced Electron BeamElectronic Instrumentation
Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology generation. Many breakthroughs were studied and applied to EX-11 to meet future mask-fabrication requirements, such as critical dimension and positioning accuracy. We have verified the accuracy required for 0.15 - 0.18 micrometer generation.