Munehiro Ogasawara

Multi-beam mask writer MBM-1000 and its application field

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 35 citations

Engineering, Manufacturing Engineering, Microfabrication +12

Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system

Munehiro Ogasawara, Naoharu Shimomura, Jun Takamatsu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 18 citations

Engineering, Materials Science, Physics +12

Focused Ion Beam Assisted Etching of Quartz in XeF₂ without Transmittance Reduction for Phase Shifting Mask Repair

Hiroko Nakamura, Haruki Komano, Munehiro Ogasawara · Japanese Journal of Applied Physics · 1992 · 14 citations

Engineering, Materials Engineering, Materials Science +15

Electron beam mask writer EBM-9500 for logic 7nm node generation

Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 13 citations

Engineering, Electrical Engineering, Manufacturing Engineering +14

Reduction of fogging effect caused by scattered electrons in an electron beam system

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations

Natural Sciences, Physics, Optics +12