Concepedia

Haruki Komano

HK

Statistics

Publications

5

Citations

98

H-Index

5

Active since

1989

Affiliations

Toshiba (Japan)(Current)

Haruki Komano is an author at Toshiba (Japan) specializing in engineering, materials engineering, and materials science.

Publications per year

1989–1996

5

Publications

5

Beam induced deposition of an ultraviolet transparent silicon oxide film by focused gallium ion beam

Masataka Ogasawara, Mitsuyo Kariya, Hiroko Nakamura et al. · Applied Physics Letters · 1996 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +17

A rewiring technique for integrated circuit operation analysis using a silicon oxide film deposited by a focused ion beam

Haruki Komano, Hiroko Nakamura, Tadahiro Takigawa · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 23 citations

Engineering, Computer Engineering, Electrical Engineering +14

Silicon Oxide Film Formation by Focused Ion Beam (FIB)-Assisted Deposition

Haruki Komano, Youji Ogawa, Tadahiro Takigawa · Japanese Journal of Applied Physics · 1989 · 20 citations

Engineering, Materials Engineering, Materials Science +17

A study of radiation damage in SiN and SiC mask membranes

Masamitsu Itoh, Masaru Hori, Haruki Komano et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 18 citations

Engineering, Materials Engineering, Materials Science +14

Focused Ion Beam Assisted Etching of Quartz in XeF<sub>2</sub> without Transmittance Reduction for Phase Shifting Mask Repair

Hiroko Nakamura, Haruki Komano, Munehiro Ogasawara · Japanese Journal of Applied Physics · 1992 · 14 citations

Engineering, Materials Engineering, Materials Science +15

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