Critical Dimension Control

Critical Dimension Control is a metrological framework in thin film lithography that specifies the precise regulation and measurement of feature sizes at the nanoscale to ensure fidelity between design intent and fabricated patterns.

377

Publications

11.8K

Citations

1.8K

Authors

299

Institutions

Publications per year

2017–2026

46

Authors

1.8K

  1. CJ
    Costas J. Spanos

    University of California, Berkeley, United States

    8 publications · 196 citations

    8

    h-index

  2. EP
    E. Pargon

    Centre National de la Recherche Scientifique, France

    6 publications · 191 citations

    6

    h-index

  3. OJ
    O. Joubert

    Centre National de la Recherche Scientifique, France

    6 publications · 169 citations

    6

    h-index

  4. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    5 publications · 158 citations

    5

    h-index

  5. SB
    S. Barnola

    Laboratoire d'Électronique des Technologies de l'Information, France

    5 publications · 124 citations

    5

    h-index

1–5 of 1.8K

Venues