Critical Dimension Control
Critical Dimension Control is a metrological framework in thin film lithography that specifies the precise regulation and measurement of feature sizes at the nanoscale to ensure fidelity between design intent and fabricated patterns.
377
Publications
11.8K
Citations
1.8K
Authors
299
Institutions
Publications per year
2017–2026
46
Parents
377
Memristor crossbar arrays with 6-nm half-pitch and 2-nm critical dimension
Shuang Pi, Can Li, Hao Jiang et al. · Nature Nanotechnology · 2018 · 526 citations
The neoliberalisation of strategic spatial planning
Kristian Olesen · Planning Theory · 2013 · 169 citations
The Limits of Lamellae-Forming PS-<i>b</i>-PMMA Block Copolymers for Lithography
Lei Wan, Ricardo Ruiz, He Gao et al. · ACS Nano · 2015 · 154 citations
1–5 of 377
1.8K
8
h-index
6
h-index
6
h-index
5
h-index
Laboratoire d'Électronique des Technologies de l'Information, France
5 publications · 124 citations
5
h-index
1–5 of 1.8K
299
Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Paris, France
15 h-index
101 publications
2.5K citations
Laboratoire d'Électronique des Technologies de l'Information
Grenoble, France
14 h-index
97 publications
2.4K citations
IBM (United States)
Armonk, United States
14 h-index
97 publications
3.6K citations

Centre National de la Recherche Scientifique
Paris, France
14 h-index
60 publications
1.8K citations
University of California, Berkeley
Berkeley, United States
14 h-index
44 publications
1.5K citations
ASML (Netherlands)
Veldhoven, The Netherlands
12 h-index
72 publications
2.8K citations
Intel (United States)
Santa Clara, United States
12 h-index
48 publications
1K citations
CEA Grenoble
Grenoble, France
11 h-index
58 publications
1.6K citations
1–8 of 299
120 publications · 2.4K citations
24
h-index
55 publications · 1.4K citations
22
h-index
22 publications · 595 citations
16
h-index
JJAP · 21 publications · 435 citations
13
h-index
15 publications · 354 citations
13
h-index
1–5