Thomas Scherübl

Aerial imaging technology for photomask qualification: from a microscope to a metrology tool

Anthony Garetto, Thomas Scherübl, Jan Hendrik Peters · Advanced Optical Technologies · 2012 · 17 citations

High Resolution, Engineering, Electron-beam Lithography +29

Using the AIMS 45-193i for hyper-NA imaging applications

Peter De Bisschop, Vicky Philipsen, Robert Birkner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 17 citations

High Resolution, Engineering, Microscopy +26

Novel solution for in-die phase control under scanner equivalent optical settings for 45nm node and below

Sascha Perlitz, Ute Buttgereit, Thomas Scherübl et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 14 citations

Engineering, Optical Transmission System, Microscopy +24

WLCD: a new system for wafer level CD metrology on photomasks

Sven Martin, Holger Seitz, Wolfgang Degel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 14 citations

Engineering, Optical Testing, Wafer Fab +16

Results of a round robin measurement on a new CD mask standard

Fritz Gans, Roman Liebe, Jan Richter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 12 citations