Jan Hendrik Peters

Massively parallel E-beam inspection: enabling next-generation patterned defect inspection for wafer and mask manufacturing

Matt Malloy, B. L. Thiel, Benjamin Bunday et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 23 citations

Aerial imaging technology for photomask qualification: from a microscope to a metrology tool

Anthony Garetto, Thomas Scherübl, Jan Hendrik Peters · Advanced Optical Technologies · 2012 · 17 citations

High Resolution, Engineering, Electron-beam Lithography +29

Actinic review of EUV masks: first results from the AIMS EUV system integration

Markus R. Weiss, Dirk Hellweg, Jan Hendrik Peters et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 14 citations

Determination of mask-induced polarization effects occurring in hyper NA immersion lithography

Silvio Teuber, Karsten Bubke, I. Höllein et al. · Optical Microlithography XVIII · 2005 · 13 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Defect mitigation considerations for EUV photomasks

Anthony Garetto, Renzo Capelli, Frederik Blumrich et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2014 · 11 citations

Engineering, Ml Defects, Ophthalmology +9