Concepedia
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Publications
1
Citations
13
H-Index
Active since
2005
Affiliations
Advanced Mask Technology Center (Germany)(Current)
I. Höllein is an author at Advanced Mask Technology Center (Germany) specializing in optoelectronics, optical materials, and optics.
Publications per year
2005–2005
Determination of mask-induced polarization effects occurring in hyper NA immersion lithography
Silvio Teuber, Karsten Bubke, I. Höllein et al. · Optical Microlithography XVIII · 2005 · 13 citations
Natural Sciences, Materials Engineering, Materials Science +15
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