Ute Buttgereit

Using the AIMS 45-193i for hyper-NA imaging applications

Peter De Bisschop, Vicky Philipsen, Robert Birkner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 17 citations

High Resolution, Engineering, Microscopy +26

Novel solution for in-die phase control under scanner equivalent optical settings for 45nm node and below

Sascha Perlitz, Ute Buttgereit, Thomas Scherübl et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 14 citations

Engineering, Optical Transmission System, Microscopy +24

WLCD: a new system for wafer level CD metrology on photomasks

Sven Martin, Holger Seitz, Wolfgang Degel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 14 citations

Engineering, Optical Testing, Wafer Fab +16

Investigation of polarization effects on new mask materials

Karsten Bubke, Silvio Teuber, Ingo Hoellein et al. · Optical Microlithography XVIII · 2005 · 13 citations

Optical Materials, Engineering, Electron-beam Lithography +16