Concepedia

Fritz Gans

FG

3

Publications

40

Citations

3

H-Index

2005

Active since

Affiliations

Advanced Mask Technology Center (Germany)(Current)

Mentor Technologies

GlobalFoundries (United States)

Photometrics (United States)

Fritz Gans is an author at Advanced Mask Technology Center (Germany) specializing in optical properties, photonics, and calibration.

Top concepts

Publications per year

2005–2013

3

Publications

3

The impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Tim Lin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 15 citations

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Impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Tim Lin et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 13 citations

, , +19

Results of a round robin measurement on a new CD mask standard

Fritz Gans, Roman Liebe, Jan Richter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 12 citations

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