John L. Sturtevant

<title>Nonconstant diffusion coefficients: short description of modeling and comparison to experimental results</title>

John S. Petersen, Chris A. Mack, John L. Sturtevant et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 32 citations

Engineering, Free Volume, Short Description +23

Calibration of chemically amplified resist models

Jeff D. Byers, John S. Petersen, John L. Sturtevant · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 21 citations

Engineering, Electron-beam Lithography, Measurement +19

Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance

Kyle Patterson, John L. Sturtevant, J. Alvis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 20 citations

Polysilicon Ler, Electrical Engineering, Physical Design (Electronics) +15

High-precision contouring from SEM image in 32-nm lithography and beyond

Hiroyuki Shindo, Akiyuki Sugiyama, Hitoshi Komuro et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 18 citations

Engineering, Electron-beam Lithography, Microscopy +29

Effect of monomer sequence distribution in 2-vinylnaphthalene-maleic acid copolymers on energy migration and excimer formation in aqueous solution

Yotaro Morishima, Hak Sang Lim, Shun‐ichi Nozakura et al. · Macromolecules · 1989 · 17 citations

Macromolecular Chemistry, Engineering, Altmetric Attention Score +21