Jeff D. Byers

<title>Nonconstant diffusion coefficients: short description of modeling and comparison to experimental results</title>

John S. Petersen, Chris A. Mack, John L. Sturtevant et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 32 citations

Engineering, Free Volume, Short Description +23

157 nm resist materials: Progress report

Colin J. Brodsky, Jeff D. Byers, Will Conley et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 29 citations

Engineering, Electron-beam Lithography, Organic Electronics +18

Infrared photothermal imaging spectroscopy for detection of trace explosives on surfaces

Christopher A. Kendziora, Robert Furstenberg, Michael R. Papantonakis et al. · Applied Optics · 2015 · 28 citations

Relevant Substrate Surfaces, Engineering, Chemistry +17

<title>Characterization and modeling of a positive-acting chemically amplified resist</title>

John S. Petersen, Chris A. Mack, James W. Thackeray et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 27 citations

Engineering, Electron-beam Lithography, Chemistry +16

Characterization of CD-SEM metrology for iArF photoresist materials

Benjamin Bunday, Aaron Cordes, Ndubuisi G. Orji et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 23 citations

Cd-sem Metrology, Engineering, Electron-beam Lithography +18