Concepedia
Statistics
Publications
6
Citations
145
H-Index
Active since
2003
Affiliations
Carl Zeiss (Germany)(Current)
ASML (Netherlands)
ASM International (Belgium)
Petra Spies is an author at Carl Zeiss (Germany) specializing in mask repair, mask design, and mask fabrication.
Publications per year
2003–2014
Electron-beam-based photomask repair
Klaus Edinger, Hans Becht, Johannes Bihr et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 78 citations
Engineering, Materials Engineering, Materials Science +15
Demonstration of damage-free mask repair using electron beam-induced processes
Ted Liang, Alan R. Stivers, M. J. Penn et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 22 citations
Engineering, Materials Engineering, Materials Science +17
A novel electron-beam-based photomask repair tool
Klaus Edinger, Hans Becht, Rainer Becker et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 13 citations
Engineering, Electrical Engineering, Materials Science +17
Bringing mask repair to the next level
Klaus Edinger, K.‐D. Wolff, H. Steigerwald et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 11 citations
Engineering, Optometry, Microfabrication +14
EUV mask stack optimization for enhanced imaging performance
Eelco van Setten, Dorothe Oorschot, Cheuk-Wah Man et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 11 citations
Natural Sciences, Materials Engineering, Materials Science +16
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