Concepedia

Cheuk-Wah Man

CM

Statistics

Publications

3

Citations

41

H-Index

3

Active since

2010

Affiliations

ASML (Netherlands)(Current)

Hoya (Japan)

Cheuk-Wah Man is an author at ASML (Netherlands) specializing in mask design, mask fabrication, and optical materials.

Publications per year

2010–2021

3

Publications

3

Investigation into a prototype extreme ultraviolet low-n attenuated phase-shift mask

Claire van Lare, Frank Timmermans, Jo Finders et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2021 · 19 citations

, , +12

EUV mask stack optimization for enhanced imaging performance

Eelco van Setten, Dorothe Oorschot, Cheuk-Wah Man et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 11 citations

, , +16

Investigation into a prototype EUV attenuated phase-shift mask

Claire van Lare, Frank Timmermans, Jo Finders et al. · 2021 · 11 citations

, , +17

1–3 of 3