E. Mastromatteo

Stress Memorization Technique (SMT) Optimization for 45nm CMOS

C. Ortolland, P. Morin, C. Chaton et al. · 2006 · 38 citations

Materials Engineering, Electrical Engineering, Engineering +11

Low pressure chemical vapor deposition of B-N-C-H films from triethylamine borane complex

R. Lévy, E. Mastromatteo, J. M. Grow et al. · Journal of materials research/Pratt's guide to venture capital sources · 1995 · 37 citations

Chemical Engineering, Boron Nitride, Engineering +8

Demonstration of an extendable and industrial 300mm BEOL integration for the 65-mn technology node

O. Hinsinger, Robert Fox, E. Sabouret et al. · 2005 · 15 citations

65-Mn Technology Node, Electrical Engineering, Physical Design (Electronics) +14

Aspects of the selective deposition of TiSi2 by LRP-CVD for use in ULSI submicron technology

J.L. Regolini, E. Mastromatteo, M. Gauneau et al. · Applied Surface Science · 1991 · 12 citations

Materials Engineering, Materials Science, Electrical Engineering +12

Single-wafer/mini-batch approach for fast cycle time in advanced 300-mm fab

Olivier Bonnin, Dominique Mercier, Davide Levy et al. · IEEE Transactions on Semiconductor Manufacturing · 2003 · 11 citations

Electrical Engineering, Wafer Scale Processing, Engineering +15