Concepedia

Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

Yake Wang, Yi Zeng, Tianjun Yu, Xudong Guo, Shuangqing Wang, Timothée Allenet, Michaela Vockenhuber, Yasin Ekinci, Jun Zhao, Shumin Yang,

ACS Omega · 2022 · 24 citations · 35 references

DOIFull text

Open access

Concepts

Abstract

-Boc protecting ratio and the patterning ability and supply useful guidelines for designing molecular resists.

References

35

Resolution Limits of Electron-Beam Lithography toward the Atomic Scale

Vitor R. Manfrinato, Lihua Zhang, Dong Su et al. · Nano Letters · 2013 · 446 citations · Full text

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Optimization of High-Performance Blue Organic Light-Emitting Diodes Containing Tetraphenylsilane Molecular Glass Materials

Li‐Hsin Chan, Rong‐Ho Lee, Chia-Fen Hsieh et al. · Journal of the American Chemical Society · 2002 · 214 citations

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Molecular Glass Resists as High‐Resolution Patterning Materials

Anuja De Silva, Nelson Felix, Christopher K. Ober · Advanced Materials · 2008 · 117 citations

, , +6

Molecular Glass Resists for High-Resolution Patterning

Jun Yan Dai, Seung Wook Chang, Alyssandrea H. Hamad et al. · Chemistry of Materials · 2006 · 104 citations

, , +8

Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography

Seung Wook Chang, Ramakrishnan Ayothi, Daniel Bratton et al. · Journal of Materials Chemistry · 2006 · 86 citations

, , +11