Timothée Allenet

Statistics

Publications

Citations

118

H-Index

Active since

2020

Affiliations

Paul Scherrer Institute(Current)

Technical Institute of Physics and Chemistry

ASML (Netherlands)

University of Chinese Academy of Sciences

Timothée Allenet is an author at Paul Scherrer Institute specializing in electron beam lithography, interference lithography, and electronic materials.

Publications per year

2020–2022

Publications

Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography

Zhihao Wang, Tianjun Yu, Yi Zeng et al. · ACS Applied Materials & Interfaces · 2022 · 43 citations

Natural Sciences, Materials Engineering, Materials Science +16

Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

Yake Wang, Yi Zeng, Tianjun Yu et al. · ACS Omega · 2022 · 24 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +13

Open-source software for SEM metrology

Iacopo Mochi, Michaela Vockenhuber, Timothée Allenet et al. · 2020 · 14 citations · Full text

Engineering, Computer Science, Computer Vision +8

Progress in EUV-interference lithography resist screening towards the deployment of high-NA lithography

Timothée Allenet, Xiaolong Wang, Michaela Vockenhuber et al. · 2021 · 14 citations · Full text

Engineering, Electrical Engineering, Materials Engineering +12

Progress in EUV resists status towards high-NA EUV lithography

Xiaolong Wang, Li‐Ting Tseng, Timothée Allenet et al. · 2020 · 12 citations

Engineering, Electrical Engineering, Materials Science +13

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