IEEE Transactions on Electron Devices · 2002 · 78 citations · 8 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsComplementary Metal-oxide-semiconductor TechnologyDevice CharacterizationField-effect TransistorsMetal-oxide-semiconductor Field-effect TransistorsOxide SemiconductorsSemiconductor Device MaterialsChannel Doping EffectsChannelsGate OxidesSilicon Carbide (Sic) Materials
Vertical trench-gate metal-oxide-semiconductor field-effect transistors (UMOSFETs) in 4H-SiC having both trench oxide protection and junction termination extension (JTE) are reported for the first time. Devices are fabricated with and without counter-doped channels. Blocking voltages and specific on-resistances are 3360 V and 199 m/spl Omega/-cm/sup 2/ for doped-channel FETs and 3055 V and 121 m/spl Omega/-cm/sup 2/ for FETs without doped channels. These blocking voltages are the highest reported to date for UMOSFETs in SiC.
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Ionization rates and critical fields in 4H silicon carbide
Andrey O. Konstantinov, Q. Wahab, N. Nordell et al. · Applied Physics Letters · 1997 · 398 citations
Shoichi Onda, Rajesh Kumar, K. Hara · physica status solidi (a) · 1997 · 80 citations
Engineering, Electrical Engineering, Materials Engineering +17