Channel Doping Effects

Channel Doping Effects is a semiconductor device physics phenomenon characterized by the intentional modulation of the channel region's doping concentration to mitigate short-channel effects in metal-oxide-semiconductor field-effect transistors by enhancing electrostatic gate control and suppressing drain-induced barrier lowering.

1.2K

Publications

56.8K

Citations

4.8K

Authors

706

Institutions

Publications per year

2017–2026

232

Authors

4.8K

  1. CH
    Chenming Hu

    University of California, Berkeley, United States

    16 publications · 1.2K citations

    14

    h-index

  2. DA
    D.A. Antoniadis

    Massachusetts Institute of Technology, United States

    16 publications · 915 citations

    13

    h-index

  3. AK
    Abhinav Kranti

    Indian Institute of Technology Indore, India

    12 publications · 494 citations

    12

    h-index

  4. SC
    S. Cristoloveanu

    Institut polytechnique de Grenoble, France

    13 publications · 582 citations

    11

    h-index

  5. BZ
    Bo Zhang

    University of Electronic Science and Technology of China, China

    12 publications · 284 citations

    11

    h-index

1–5 of 4.8K

Venues

  1. IEEE Transactions on Electron Devices

    295 publications · 14.7K citations

    61

    h-index

  2. IEEE Electron Device Letters

    166 publications · 9.7K citations

    52

    h-index

  3. Applied Physics Letters

    71 publications · 4K citations

    34

    h-index

  4. Solid-State Electronics

    56 publications · 1.6K citations

    22

    h-index

  5. Superlattices and Microstructures

    25 publications · 706 citations

    19

    h-index

1–5