Channel Doping Effects
Channel Doping Effects is a semiconductor device physics phenomenon characterized by the intentional modulation of the channel region's doping concentration to mitigate short-channel effects in metal-oxide-semiconductor field-effect transistors by enhancing electrostatic gate control and suppressing drain-induced barrier lowering.
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706
Institutions
Publications per year
2017–2026
232
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High-Performance Single Layered WSe<sub>2</sub> p-FETs with Chemically Doped Contacts
Hui Fang, Steven S.C. Chuang, Ting Chia Chang et al. · Nano Letters · 2012 · 1.8K citations · Full text
Junctionless multigate field-effect transistor
Chi‐Woo Lee, Aryan Afzalian, Nima Dehdashti Akhavan et al. · Applied Physics Letters · 2009 · 925 citations · Full text
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University of Electronic Science and Technology of China, China
12 publications · 284 citations
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IBM (United States)
Armonk, United States
29 h-index
280 publications
13.5K citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
25 h-index
176 publications
10.4K citations
University of California, Berkeley
Berkeley, United States
20 h-index
101 publications
18.1K citations

National Yang Ming Chiao Tung University
Hsinchu, Taiwan
19 h-index
114 publications
3K citations
Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Paris, France
19 h-index
120 publications
4K citations
Massachusetts Institute of Technology
Cambridge, United States
18 h-index
74 publications
4.8K citations
IMEC
Leuven, Belgium
18 h-index
165 publications
5.2K citations
CEA Grenoble
Grenoble, France
18 h-index
106 publications
3.4K citations
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295 publications · 14.7K citations
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166 publications · 9.7K citations
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