A clamped through silicon via (TSV) interconnection for stacked chip bonding using metal cap on pad and metal column forming in via

Li‐Cheng Shen, Chien-Wei Chien, Jin-Ye Jaung, Yin-Po Hung, Wei‐Chung Lo, Chao-Kai Hsu, Yuan‐Chang Lee, Hsien‐Chie Cheng, Chia-Te Lin

2008 · 10 citations · 9 references

Concepts

Abstract

To prevent potential yield loss, achieve TSV with higher aspect ratio, improve the bonding reliability, and reduce the process cost, a clamped through silicon via (C-TSV) interconnection for stacked chip bonding is proposed and developed in this paper. The metal cap on pad design can not only be a bonding layer for other stacked die on it, but also performs as a protection stopper for blind vias drilled from the wafer backside..

References

9