Design, fabrication, and characterization of low forward drop, low leakage, 1-kV 4H-SiC JBS rectifiers

Abstract

The 1-kV 4H-SiC planar junction barrier Schottky (JBS) rectifiers were designed, fabricated, and characterized. Different p+ implantation dosages and activation anneal methods were used to determine an optimum baseline process. Using the optimized process, the forward drop of our JBS rectifiers is <1.5 V while the reverse leakage current density is <1/spl times/10/sup -5/ A/cm/sup -2/. Blocking voltage>1 kV was achieved using a single-zone junction termination extension termination. It was shown experimentally that 4-/spl mu/m p-type implantation window spacing gives an optimum tradeoff between forward drop voltage and leakage current density for these rectifiers, yielding a specific on-resistance of 3 m/spl Omega//spl middot/cm/sup 2/.