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R. B. van Dover, L. F. Schneemeyer, R. M. Fleming · Nature · 1998 · 356 citations

Natural Sciences, Materials Engineering, Materials Science +14

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Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

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Natural Sciences, Chemistry, Materials Science +10

Chemical kinetics in chemical vapor deposition: growth of silicon dioxide from tetraethoxysilane (TEOS)

Michael E. Coltrin, Pauline Ho, Harry K. Moffat et al. · Thin Solid Films · 2000 · 66 citations

Natural Sciences, Materials Engineering, Materials Science +16