Deposition Kinetics

Deposition Kinetics is a theoretical construct in materials and surface science that characterizes the rate and mechanistic pathways of solute or particle accumulation on substrates during phase transition or film formation processes, distinguishing itself from equilibrium deposition models by emphasizing time-dependent dynamics and interfacial reaction mechanisms.

2K

Publications

93.9K

Citations

5.9K

Authors

1.4K

Institutions

Publications per year

2017–2026

237

Authors

5.9K

  1. ME
    Menachem Elimelech

    Yale University, United States

    18 publications · 3.7K citations

    18

    h-index

  2. ZA
    Zbǐgniew Adamczyk

    Jerzy Haber Institute of Catalysis and Surface Chemistry, Polish Academy of Sciences, Poland

    20 publications · 1.1K citations

    17

    h-index

  3. PM
    Paul Meakin

    DuPont (United States), United States

    15 publications · 1.5K citations

    14

    h-index

  4. CL
    Changhee Lee

    Hanyang University, South Korea

    12 publications · 689 citations

    12

    h-index

  5. KJ
    Klaus J. Hüttinger

    Karlsruhe Institute of Technology, Germany

    10 publications · 761 citations

    10

    h-index

1–5 of 5.9K

Venues

  1. Journal of The Electrochemical Society

    JES · 156 publications · 7.5K citations

    45

    h-index

  2. Journal of Applied Physics

    86 publications · 4.4K citations

    40

    h-index

  3. Thin Solid Films

    117 publications · 4.2K citations

    36

    h-index

  4. Langmuir

    54 publications · 4.7K citations

    31

    h-index

  5. Environmental Science & Technology

    33 publications · 4.3K citations

    30

    h-index

1–5