Daniel G. Colombo

Does Chemistry Really Matter in the Chemical Vapor Deposition of Titanium Dioxide? Precursor and Kinetic Effects on the Microstructure of Polycrystalline Films

C. James Taylor, D. C. Gilmer, Daniel G. Colombo et al. · Journal of the American Chemical Society · 1999 · 145 citations

Engineering, Tio2 Deposition Kinetics, Oxidation Resistance +17

Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

Daniel G. Colombo, D. C. Gilmer, Victor G. Young et al. · Chemical Vapor Deposition · 1998 · 87 citations

Materials Science, Chemical Engineering, Necessary Volatility +10

Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV

D. C. Gilmer, Daniel G. Colombo, C. James Taylor et al. · Chemical Vapor Deposition · 1998 · 51 citations

Materials Science, Materials Engineering, Material Analysis +8

Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(<scp>IV</scp>

D. C. Gilmer, Daniel G. Colombo, C. James Taylor et al. · Chemical Vapor Deposition · 1998 · 49 citations

Engineering, Solid-state Chemistry, Thin Film Process Technology +16

Proton conducting membrane for fuel cells

Daniel G. Colombo · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) · 2023 · 31 citations · Full text