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A stacked SONOS technology, up to 4 levels and 6nm crystalline nanowires, with gate-all-around or independent gates (Φ-Flash), suitable for full 3D integration.

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Citations

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References

2009

Year

A. Hubert, Emmanuel Nowak, K. Tachi, V. Maffini-Alvaro, C. Vizioz, C. Arvet, J. P. Colonna, Jean‐Michel Hartmann, V. Loup, L. Baud,
HAL (Le Centre pour la Communication Scientifique Directe)

Abstract

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References

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