IEEE Transactions on Electron Devices · 2011 · 95 citations · 18 references
Inverted StructureWide-bandgap SemiconductorElectrical EngineeringEngineeringShort-channel EffectsPhysicsRf SemiconductorNanoelectronicsN-polar HemtsApplied PhysicsAluminum Gallium NitrideGan Power DeviceGa-polar HemtsMicroelectronicsOptoelectronicsCategoryiii-v Semiconductor
We have carried out 2-D simulation of N-polar and Ga-polar AlGaN/GaN HEMTs to investigate short-channel effects in highly scaled devices. N-polar HEMTs were found to have better drain-induced barrier lowering (DIBL) suppression than Ga-polar HEMTs. The short-channel effects were found to originate from the 2-D potential distribution in the channel and space-charge-limited current through the buffer. The inverted structure of the N-polar HEMT was found to provide better suppression of short-channel effects under idealized theoretical assumptions that were used in the model presented.
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AlGaN/GaN HEMT With 300-GHz $f_{\max}$
J.W. Chung, W. E. Hoke, Eduardo M. Chumbes et al. · IEEE Electron Device Letters · 2010 · 375 citations
Wide-bandgap Semiconductor, Electrical Engineering, Recessed Algan Barrier +10