IEEE Transactions on Nuclear Science · 2001 · 45 citations · 11 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsSemiconductor DevicesCarrier TransportDevice CharacterizationDevice ModelingDevice ReliabilitySemiconductor PhysicsSemiconductor ReliabilityAvalanche BreakdownBreakdown MechanismsCarrier DriftCarrier Drift VelocityDrift-diffusion ModelingGate Oxide DegradationMetal-oxide-semiconductor Field-effect Transistor ModelingPhysics-based Simulation
This paper presents a new physics-based model for understanding the basic mechanism of single-event gate rupture (SEGR) in analog devices. This model accounts for the different competing physics mechanisms, such as carrier drift, diffusion, recombination in the drift diffusion, and Poisson's equations, to explain the dependence of SEGR on biasing voltage, cross section, and critical electric field strength. Hence, the model provides a more accurate method of understanding and predicting the breakdown of oxides from heavy-ion strikes.
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Formation of Etchable Tracks in Dielectrics
Robert Katz, E. J. Kobetich · Physical Review · 1968 · 189 citations
Natural Sciences, Materials Engineering, Materials Science +17
Single event gate rupture in thin gate oxides
F.W. Sexton, Daniel M. Fleetwood, M.R. Shaneyfelt et al. · IEEE Transactions on Nuclear Science · 1997 · 122 citations