IEEE Transactions on Electron Devices · 1976 · 36 citations · 17 references
EngineeringElectrical EngineeringPhysicsMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDevice CharacterizationDevice ModelingDopingP-n JunctionsSemiconductor Device MaterialsSemiconductor PhysicsChannel Doping EffectsDoping Effects On Device PerformanceForward Bias CharacteristicsHigh-temperature Device OperationP-n Junction CharacteristicsSemiconductor CharacterizationThreshold Voltage
p-channel MOSFET parameters measured at 300 K, 77 K, and 4.2 K are discussed; these include I-V characteristic curves, channel conductance, transconductance, threshold voltage, field effect mobility, and forward and reverse p <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> n junction characteristics. Some qualitative explanations of the dependence of the data on temperature and substrate doping concentration are given. Interesting LHe phenomena are highlighted and discussed in terms of accepted solid state models.
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Theory of Impurity Scattering in Semiconductors
E. M. Conwell, V. F. Weisskopf · Physical Review · 1950 · 931 citations
Transport Properties of Electrons in Inverted Silicon Surfaces
F. F. Fang, A. B. Fowler · Physical Review · 1968 · 332 citations
Neutral Impurity Scattering in Semiconductors
N. Sclar · Physical Review · 1956 · 150 citations