Estimation of resist profile for line/space patterns using layer-based exposure modeling in electron-beam lithography

PROXECCO—Proximity effect correction by convolution

Hans Eisenmann, Thomas Waas, Hans Hartmann · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 57 citations

Computing, Computer Science, Computational Electromagnetics +8

Process optimization and proximity effect correction for gray scale e-beam lithography

Raghunath Murali, Devin K. Brown, K. P. Martin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 45 citations

Engineering, Manufacturing Engineering, Materials Engineering +11

Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography

Morimi Osawa, Kimitoshi Takahashi, Masami Sato et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 45 citations

Engineering, Computer Science, Computational Electromagnetics +13

Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system)

Yoshihiko Hirai, S. Tomida, Kazuhiko Ikeda et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · 1991 · 42 citations

Engineering, Computer Engineering, High-performance Computing +12

Analysis of three-dimensional proximity effect in electron-beam lithography

S.-Y. Lee, Kasi Anbumony · Microelectronic Engineering · 2005 · 27 citations

Engineering, Electrical Engineering, Materials Science +12