Morimi Osawa is an author at Fujitsu (Japan) specializing in computational electromagnetics, engineering, and applied physics.
Top concepts
EngineeringComputational ElectromagneticsRadarApplied PhysicsPhysicsRadiologyOphthalmologyInstrumentationMedical ImagingInverse Problems
Publications per year
2000–2003
3
3
Correction for local flare effects approximated with double Gaussian profile in ArF lithography
Morimi Osawa, Teruyoshi Yao, Hajime Aoyama et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 16 citations
Local Flare Correction, Electron-beam Lithography, Engineering +16
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