Factor structure of psychobiological seven-factor model of personality: a model-revision

Takuro Tomita, Hajime Aoyama, Takayuki Kitamura, +3

Personality and Individual Differences

Behavioral SciencesPersonality PsychologyFactor ModelsPsychological StructurePsychobiological Seven-factor Model +4

Development of Mine Detection Robot System

Hajime Aoyama, Kazuyoshi Ishikawa, Junya Seki, +3

International Journal of Advanced Robotic Systems

Mine Removal WorkEngineeringMine DesignCivil EngineeringField Robotics +9

Impact of mask absorber properties on printability in EUV lithography

Takashi Kamo, Hajime Aoyama, Toshihiko Tanaka, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabrication +11

EUV flare correction for the half-pitch 22nm node

Yukiyasu Arisawa, Hajime Aoyama, Taiga Uno, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Lithography ProcessExtreme Ultraviolet LithographyEngineeringOphthalmologyFlare Correction +11

A study of the extent and scope of local vibration hazards in Japan.

M. Takamatsu, Makoto Futatsuka, Tadayoshi Sakurai, +23

Industrial Health

EngineeringMechanical EngineeringSafety ScienceEducationInjury Prevention +18

Repair specification study for half-pitch 32-nm patterns for EUVL

Hajime Aoyama, Tsuyoshi Amano, Yasushi Nishiyama, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Repair Specification StudyEngineeringElectron-beam LithographyElectronic Design AutomationMicroscopy +20

Flare evaluation for 32-nm half pitch using SFET

Hajime Aoyama, Yuusuke Tanaka, Takashi Kamo, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringElectron-beam LithographyOphthalmologyOptical Properties +10

Correction for local flare effects approximated with double Gaussian profile in ArF lithography

Morimi Osawa, Teruyoshi Yao, Hajime Aoyama, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Local Flare CorrectionElectron-beam LithographyEngineeringOptic DesignOptical Testing +14

Effects of mask absorber thickness on printability in EUV lithography with high resolution resist

Takashi Kamo, Hajime Aoyama, Toshihiko Tanaka, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceMask AbsorberElectrical EngineeringEngineeringElectron-beam Lithography +13

Precise Stress Control of Ta Absorber using Low Stress Alumina Etching Mask for X-Ray Mask Fabrication

Yoshihisa Iba, Fumiaki Kumasaka, Hajime Aoyama, +2

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringOxygen ConcentrationEngineeringPrecise Stress Control +12