Takashi Kamo

Actinic phase defect detection and printability analysis for patterned EUVL mask

Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 24 citations

Engineering, Electron-beam Lithography, Microscopy +18

Lean Mixture Sensor

Takashi Kamo, Yoshiki Chujo, Takao Akatsuka et al. · SAE technical papers on CD-ROM/SAE technical paper series · 1985 · 20 citations

Impact of mask absorber properties on printability in EUV lithography

Takashi Kamo, Hajime Aoyama, Toshihiko Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 20 citations

Materials Science, Engineering, Electron-beam Lithography +13

Phase defect printability and actinic dark-field mask blank inspection capability analyses

Tsuneo Terasawa, Takeshi Yamane, Takashi Kamo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 16 citations

Electrical Engineering, Phase Defect Printability, Engineering +13

Flare evaluation for 32-nm half pitch using SFET

Hajime Aoyama, Yuusuke Tanaka, Takashi Kamo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 16 citations

Electrical Engineering, Engineering, Electron-beam Lithography +12