Analysis of three-dimensional proximity effect in electron-beam lithography

Dose control for fabrication of grayscale structures using a single step electron-beam lithographic process

Fei Hu, Soo-Young Lee · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 43 citations

Engineering, Electrical Engineering, Materials Science +17

PYRAMID-a hierarchical, rule-based approach toward proximity effect correction. I. Exposure estimation

Soo-Young Lee, B.D. Cook · IEEE Transactions on Semiconductor Manufacturing · 1998 · 36 citations

Engineering, Computer Science, Electrical Engineering +11

Accuracy and efficiency in electron beam proximity effect correction

Shalom J. Wind, P. D. Gerber, H. Rothuizen · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 30 citations

Engineering, Computer Science, Materials Science +11

Sub-0.1 μ electron-beam lithography for nanostructure development

Martin Peckerar, Robert B. Bass, Kee Woo Rhee · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 21 citations

Engineering, Electrical Engineering, Materials Science +10

Simulation of electron scattering in complex nanostructures: lithography, metrology, and characterization

IV Sylvester Johnson · PhDT · 1992 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +14